I-Scenaring Electron Microscope (SEM)
Iphrojekthi | Ipharamitha | ||
Uhlelo lwe-Electron Optical | Uhlobo Lwesibhamu Se-Electron | Isibhamu se-electron se-tungsten filament esibekwe ngaphambili | |
Isixazululo | Umshini Ophezulu Wokuhlanza I-Vacuum | 5nm@10kV(SE) | |
3nm@30kV(SE) | |||
8nm@3kV(SE) | |||
Ukukhulisa | 1–300,000× (ukukhulisa okuyisisekelo) | ||
1–16× (ukukhulisa okubonakalayo) | |||
I-Voltage Yokusheshisa | 0.2kV~30kV | ||
Uhlelo Lokuthwebula Izithombe | Isitholi | Isitholi se-electron sesibili (ETD) | |
| Isitholi se-electron esihlakazekile ngemuva Isitholi se-electron yesibili esiphansi se-vacuum I-Energy dispersive spectroscopy (EDS), njll. | |||
Ifomethi Yesitoreji Sesithombe | I-TIFF, i-JPG, i-BMP, i-PNG, kufika ku-48k*32k | ||
Ukucushwa | Umsebenzi wokuzulazula obonakalayo, ohlome ngekhamera ye-CCD evundlile kanye nekhamera eqondile | ||
Uhlelo Lokuhlanza I-Vacuum | Imodi Yokuhlanza | Umshini Ophezulu Wokuhlanza I-Vacuum | Kungcono kune-5×10⁻⁴ Pa |
Umshini Ophansi Wokushaja Imishini | 5~1000Pa | ||
Indlela Yokulawula | Ukulawula okuzenzakalelayo ngokugcwele | ||
Ikamelo Eliyisibonelo | Ikhamera | Ukuzulazula okubonakalayo | |
Ukuqapha isampula yegumbi | |||
Ukucushwa Kwesigaba Sesampula | Isigaba sesampula esizenzakalelayo ngokugcwele esine-axis ezi-5 esinomklamo wangaphakathi onenjini ovalekile ngokuphelele | ||
Ibanga Lokuhamba | X:120 mm | ||
FUTHI:115 mm | |||
NE:50 mm | |||
R (Ukujikeleza): 360° elungisekayo njalo | |||
T:-10°~+90° | |||
Ikhono Lekamelo Lesampula | Ububanzi: 340 mm Ukuphakama: 274 mm Ukujula: 295 mm | ||
Usayizi Omkhulu Wesampula | Ububanzi: 270 mm Ukuphakama: 53 mm | ||


